日立高新NB5000聚焦离子束&电子束装置

Hitachi's high performance FIB-SEM provides unparalleled nano-analyses of devices and functional materials !!

Legendary Hitachi reliability and performance in an integrated system (Ultra-high performance FIB and high resolution FE-SEM) enabling high-throughput specimen preparation, high resolution imaging and analysis and precision nanofabrication. New low-damage fabrication techniques have been developed for materials sensitive to electron irradiation. Innovations in sample loading, sample navigation, and Micro-sampling increase analysis efficiency^(*1). 

Ultra-high performance FIB

• Low CsFIB optics^(*2) deliver 50nA or more of beam current (@40kV) in an about 1µm spot-size. The high current enables unconventional large-area milling, hard material fabrication and high throughput multiple specimen preparation.

New Micro-sampling

• Hitachi's patented Micro-sampling technology provides smooth probe motion. Also, the probe can be used for newly developed absorbed current imaging^(*1) to aid fault isolation.

High precision end-point detection

• High resolution SEM allows high precision end-point detection. Section-view function, which displays an outline of the cross-section utilizing the real-time FIB image, is ideal for preparing electron irradiation sensitive specimens like low-K material.

High resolution SEM

• Hitachi's unparalleled SEM column and detector design^(*2) enables high resolution SEM imaging during and after FIB fabrication.

Holder compatibility with TEM/STEM^(*1)(*2)

• A side entry STEM/TEM-type staqe^(*1) allows the use of the same specimen holder (compatible with NB5000 and Hitachi TEM/STEM). No tweezer handling of specimen during transfer results in higher throughput TEM/STEM analysis.

^(*1):Optional accessory
^(*2):Hitachi patent
Low Cs FIB optics: patent pending, Micro-sampling: JP2774884/US5270552, Section-view function: patent pending, SEM column and detector design: JP3081393/US5387793, Holder compatibility: JP2842083

日立高性能聚焦离子束-扫描电子显微镜的融合是纳米材料、功能材料的加工分析利器！

日立产品高稳定性与高性能的融合(超高性能聚焦离子束和超高分辨率场发射电子显微镜)使得样品制备、高分辨观察、分析以及精准纳米尺度加工成为可能。全新开发的低损伤加工技术适用于电子辐照敏感材料。在样品装载、样品导航和微小样品加工方面的创新，可提高分析效率*。

*：选配件

Specifications
 

CP:Beam Cross Point

^(*1):Optional accessory
^(*2):When side entry stage is ordered